High-Resolution Artwork Outpainting with Global Blueprint Guidance and Layout Control
ECCV 2026
Hanyang University, Seoul, Republic of Korea† Corresponding author
BlueOut expands a source artwork into a coherent and controllable high-resolution canvas through global blueprint guidance and parallel patch synthesis.
Outpainting Process Demo
Abstract
High-resolution artwork outpainting requires both stylistic consistency and globally coherent structure across a substantially expanded canvas. Existing progressive methods can accumulate errors, provide limited spatial control, and synthesize local patches sequentially. BlueOut addresses these limitations with a two-stage framework. It first generates a layout-conditioned global blueprint and then uses the blueprint to guide parallel high-resolution patch synthesis. This design improves visual fidelity and semantic consistency while substantially reducing inference time.
Method
A global blueprint coordinates all high-resolution regions of the expanded canvas.
Stage 1 generates a low-resolution blueprint of the complete scene from the source artwork and optional layout conditions. Stage 2 transfers blueprint features and patch-position information to the high-resolution denoiser. The patches are then synthesized in parallel and blended with the preserved source image.
Results
Qualitative Comparisons
Layout-Controlled Outpainting
Poster
BibTeX
@article{kim2026highresolution,
title = {High-Resolution Artwork Outpainting with Global
Blueprint Guidance and Layout Control},
author = {Kim, Junha and Park, Hyunjoon and Cho, Donghyeon},
journal = {arXiv preprint arXiv:2607.06162},
year = {2026}
}